The Surface Analysis and Fabrication Platform offers XPS measurements using a SPECS SAGE HR 100 system equipped with a 100 mm mean radius PHOIBOS analyzer, AFM analysis with a Multimode V from Bruker and thin film deposition using an ATC 1800 UHV reactive magnetron sputtering system, an Edwards Auto 500 thermal evaporator/sputter coater.
In addition to the XPS and AFM measurements and thin films deposition, the Surface Analysis and Fabrication Platform also offers the possibility of review and discuss the specific requirements of the user improving and optimizing the processes and offering data interpretation.
Atomic Force Microscopy. Allows the topographical study of dry surfaces or immersed in liquid. The presence of impurities in materials can be determined from the topographic image with atomic resolution. In addition, by operating in force mode, indentation studies can be performed, which allow to obtain quantitative maps with mechanical properties such as the moduli of elasticity, deformation-dissipation or adhesion.
Applications: determination of surface roughness, grain size or nanoparticle size on surfaces and substrates, nano-mechanical properties of surfaces. Applicable to the study of different substrates such as: films, polymers, cells, proteins, viruses, bacteria, biomolecules, etc.
Elemental composition analysis by X-ray Photoelectron Spectroscopy (XPS). It is a surface analysis technique that allows determining the composition of the most superficial layer of a material, both qualitatively and quantitatively. It also allows to determine the chemical state of the elements present on the surface of a material. Sample analyzed include a results report containing the overall spectrum, the high-resolution spectra of the requested regions, the mathematical fit applied, and the calculation of the relative composition of the oxidation states for each region.
Applications: study of the corrosion of materials, assessment of substrate stability, determination of impurities, study of variations in material composition based on argon plasma treatment time.
Physical Vapor Deposition. Produce the coating of surfaces (organic or inorganic) with mono or multi atomic layers with thicknesses ranging from one nanometer to several microns by means of magnetron sputtering. Up to three sources of atomization can be combined, allowing the deposition of multiple layers of thin films and nano-composite structures.
Applications: metallization of samples to generate conductive surfaces, coating with semiconductors, biocompatible titanium coatings, improvement of the mechanical properties of materials, etc. The following targets are available: Aluminium, Chromium, Copper, Hafnium, Niobium, Silicon, Tantalum, Titanium, Gold and Zinc. These elements can be deposited in pure form and in their corresponding carbide, nitride or oxide derivatives. The deposition of elements (targets) not listed above can be evaluated.
Atomic Force Microscope, AFM – Veeco Bruker Multimode 8-HR. It is equipped with the MM PeakForce QNM module. It has a support to measure samples in liquid. Viscoelasticity studies can be performed at frequencies between 0.1 Hz and 4 kHz. The maximum sample size is 1 cm2. The system is controlled with Nanoscope PeakForce QNM software.
X-ray-Induced Photoemission Spectroscope XPS/UPS – SPECS SAGE HR-100. It is equipped with a 100 mm radius PHOIBOS analyser. It allows to perform analysis of elemental composition and determine the energy of the valence levels down to a depth of 5 to 10 nm. It has two non-monochromatic X-ray sources (Al Kα and Mg Kα) and a UVS 10/35 ultraviolet light source. Surface layers can be removed from substrates by using Ar+ ion plasma, as well as making a composition profile as a function of time of application.
Physical Vapor Deposition System PVD – AJA ATC 1800-UVH. It consists of an ultra-high vacuum chamber, and a power control system that with two radio frequency and direct current (RF / DC) power sources, with the ability to atomize and spray up to three targets on the surface of any type of substrate. The rotating sample platform has a diameter of 9 cm and allows substrates to be heated up to 600 °C.
CONTACT
Desirè Di Silvio · 943 005 337 · ddisilvio@cicbiomagune.es
PRICE LIST:
| Art. No | Description | Unit | A (€) | B (€) |
|---|---|---|---|---|
| SAF-AFM | AFM Bruker Veeco Multimode | Hour | 88,00 | 101,00 |
| SAF-AFM-TipA | AFM Standar tip · Consumable | Unit | 35,00 | 40,50 |
| SAF-PVD-SP | PVD AJA ATC 1800 Sample Preparation | Cycle | 46,00 | 52,50 |
| SAF-PVD-Au5 | 5 nm Gold | Layer | 17,00 | 19,50 |
| SAF-PVD-Au100 | 100 nm Gold | Layer | 50,50 | 58,00 |
| SAF-PVD-Ti5 | 5 nm Titanium | Layer | 8,00 | 9,20 |
| SAF-PVD-IT010 | 10 nm ITO (Indium tin oxide) | Layer | 8,00 | 9,20 |
| SAF-PVD-Si005 | 5 nm Silica Oxide | Layer | 8,00 | 9,20 |
| SAF-XPS-EC | Etching cycle with Argon | Cycle | 12,00 | 14,00 |
| SAF-XPS | Survey and C (1s) HR & Data Analysis | Sample | 52,00 | 59,50 |
| SAF-XPS-A | F, K, O (1s); Cl, Si (2p); Br, Sn (3d); Pt (4f) | Element | 32,50 | 37,50 |
| SAF-XPS-B | N, Na (1s); Na, Si (2s) | Element | 45,00 | 52,00 |
| SAF-XPS-C | Ca, P (2p); S (2s); P (2p); Au (4f) | Element | 57,50 | 66,50 |
| SAF-XPS-D | B (1s); Mg(2p); Ag (3d); Cr (3p) | Element | 65,00 | 75,00 |
| SAF-XPS-E | Ca (2s); Cd (3d); Fe (3p); La (4d); Mg; Cu, Ni, Zn | Element | 90,00 | 103,50 |
| SAF-XPS-F | Cr, Mn, Ti (2p); La (3d); Gd (4d) | Element | 102,50 | 118,00 |
| SAF-XPS-G | Co, Cu, Fe, Ni, Zn (2p); Ce (3d); Ga (4d) | Element | 150,00 | 172,50 |
| SAF-Re-DS | Data analysis or report preparation | Hour | 60,50 | 69,50 |
| SAF-XPS-hour | XPS PHI Acquisition Measurement time | Hour | 104,00 | 109,00 |
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A: Nonprofit Research and Development (R&D) Organizations and Entities associated with CIC biomaGUNE B: Other types of entities.
Prices are valid until Jan 31, 2025
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